MEMS and photomask layout

Every angle, every curve

Shapes are not snapped to 45 degrees. Tapered fingers, diagonal tethers, arcs, rounded boxes and spirals are ordinary shapes that can be moved, resized and combined like any rectangle. Boolean operations merge, subtract and size layers of any shape, so release holes, keep-out zones and offsets follow the curve.

The design rule checker works on the same all-angle geometry. Width, spacing, enclosure and density checks are not limited to integrated circuit rules, and no foundry rule deck is needed to check your own design rules.

Circles and arcs Design rule checker

Mask ready

A mask field is built from cells and arrays: dies, alignment marks, verniers and labels. Barcodes and DataMatrix codes are generated on a layer, and text can be converted into polygons so it is printed on the mask. Background images help to trace an existing drawing or a photograph.

GDSII is the native format. DXF and DWG from mechanical CAD, Gerber, CIF, OASIS and SVG open in the same editor, so a mask can combine a chip layout with a drawing from the mechanical designer.

Barcodes DXF All formats

See the device in 3D

The 3D editor builds a model from the 2D layout. A process list runs steps such as extrude, etch, deposit, fill and planarize, and a section shows the inside of the stack. The model is exported as STEP, 3MF, STL and other formats for CAD or FEM.

Coils and conductors can be extracted: inductance and resistance with FastHenry, capacitance with FastCap. Both programs are part of the package.

3D editor Inductance extraction

From the design to the photomask

Once the design is finished, the built-in photomask service sends it to photomask production around the world. The service is available in every edition, including the free one.

Photomask service Get photomasks